New Horizons in Occultation Research : Studies in Atmosphere & Climate

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ISBN: 9783642003202
Author/Editor: Steiner A

Publisher: Springer

Year: 2009

2 in stock (can be backordered)

SKU: ABD-SPR-1545 Category:

Description

Building on its heritage in planetary science, remote sensing of the Earth’s at- sphere and ionosphere with occultation methods has undergone remarkable dev- opments since the rst GPS/Met ‘proof of concept’ mission in 1995. Signals of Global Navigation Satellite Systems (GNSS) satellites are exploited by radio occ- tation while natural signal sources are used in solar, lunar, and stellar occultations. A range of atmospheric variables is provided reaching from fundamental atmospheric parameters such as density, pressure, and temperature to water vapor, ozone, and othertracegasspecies. Theutilityforatmosphereandclimatearisesfromtheunique properties of self-calibration, high accuracy and vertical resolution, global coverage, and (if using radio signals) all-weather capability. Occultations have become a va- able data source for atmospheric physics and chemistry, operational meteorology, climate research as well as for space weather and planetary science. The 3rd International Workshop on Occultations for Probing Atmosphere and Climate (OPAC-3) was held September 17-21, 2007, in Graz, Austria. OPAC-3 aimed at providing a casual forum and stimulating atmosphere for scienti c disc- sion, co-operation initiatives, and mutual learning and support amongst members of alldifferentoccultationcommunities. Theworkshopwasattendedby40participants from 14 different countries who actively contributed to a scienti c programme of high quality and to an excellent workshop atmosphere. The programme included 6 invited keynote presentations and 16 invited pres- tations, complemented by about 20 contributed ones including 8 posters

Additional information

Weight 1.097 kg

Product Properties

Year of Publication

2009

Table of Contents

1. Preface 2. Introduction 2.1 Basics of Image Processing 2.2 The Problems of Shrinking Feature Size in ULSI Development and Failure Analysis 2.3 High Resolution Imaging of Metallic Structures 2.4 High Resolution Imaging of Non-Metallic Structures 2.5 Fabrication techniques in ULSI industry 3. New Image Processing Methods for Advanced Metallization in Micro- and Nano-Electronics 3.1 Characteristics of Metal Ultra-Thin Films Microstructures 3.2 Methods Based on Sample and Imaging System Knowledge 3.3 Methods Based on Microstructure Grain Size and Shape Range Knowledge 3.4 Increased Productivity by Obviating Steps of Selection of Measurement Conditions 3.5 Demonstration of Method Capabilities 3.5.1 Demonstration on Blurred HRSEM Images of Copper and Silver Films Microstructures 3.5.2 Demonstration on Indistinct Images of Filled Trenches and Vias 4. New Super Resolving Techniques and Methods for Micro-Electronics 4.1 The basics of super resolution 4.1.1 Introduction 4.1.2 Super resolving hardware 4.1.3 Super resolving numerics 4.2 Numerical Approaches for super resolved imaging 4.2.1 High-Resolution Layout Image Transform 4.2.2 Low Resolution Image Transform (Experiment-based) 4.2.3 Results of the Comparison 4.3 Radon based super resolved imaging 4.4 Numerical approaches for characterization of ULSI circuits 4.5 Applications in Failure Analysis 4.6 Applications in Manufacturing and Testing

Author

Steiner A

ISBN/ISSN

9783642003202

Binding

Hardback

Edition

1

Publisher

Springer

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